(U-0002019C): Apply new conventions for glyph granularity for a

component of ideographic-structure.

diff --git a/lisp/utf-2000/Ideograph-R210-Even.el b/lisp/utf-2000/Ideograph-R210-Even.el
index 17b2743..21ede90 100644 (file)
--- a/lisp/utf-2000/Ideograph-R210-Even.el
+++ b/lisp/utf-2000/Ideograph-R210-Even.el
@@ -476,7 +476,6 @@
     (=ucs              . #x2019C)      ; 𠆜
     (=cns11643-7       . #x4623)       ; &I-C7-4623; [38-03]
     (=daikanwa         . 48577)        ; &I-M-48577;
-    (=hanziku-1                . #xE2BA)       ; &I-HZK01-E2BA;
     (->subsumptive
      ((ideographic-radical . 210)      ; ⿑
       (ideographic-strokes . 8)
@@ -486,17 +485,19 @@
        )
        ((==big5-cdp        . #x8DEB)   ; &g2-CDP-8DEB;
        )
-       ((=ucs@unicode      . #x59BB)   ; &AJ1-02106;
-       (=adobe-japan1-0    . 02106)    ; &AJ1-02106;
+       ((==ucs@unicode     . #x59BB)   ; &g2-AJ1-02106;
+       (==adobe-japan1-0   . 02106)    ; &g2-AJ1-02106;
        ))
       (==daikanwa        . 48577)      ; &g2-M-48577;
       )
      ((==ucs@iso         . #x2019C)    ; &g2-IU-0002019C;
       (==cns11643-7      . #x4623)     ; &g2-IU-0002019C; [38-03]
       (->subsumptive
+       ((===cns11643-7     . #x4623)   ; &R-C7-4623; [38-03]
+       )
        ((===ucs@iso        . #x2019C)  ; &R-U-0002019C;
        )
-       ((===cns11643-7     . #x4623)   ; &R-C7-4623; [38-03]
+       ((=hanziku-1        . #xE2BA)   ; &HZK01-E2BA;
        ))
       ))
     ))