+2014-12-28 MORIOKA Tomohiko <tomo.git@chise.org>
+
+ * Ideograph-R150-Valley.el (U+8C3F): Apply new conventions for
+ glyph granularity.
+ (UU+8C41): Likewise.
+ (U+8C45): Likewise.
+
+ * Ideograph-R147-See.el (UU+8996): Apply new conventions for glyph
+ granularity.
+ (U+89AA): Likewise.
+
+ * Ideograph-R101-Use.el (U-000200B5): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014].
+
+ * Ideograph-R030-Mouth.el (U-0002067C): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014].
+ (JU+5467): Apply new conventions for glyph granularity.
+ (U-00020048): Use `ideographic-{radical|strokes}@daikanwa' instead
+ of `ideographic-{radical|strokes}@cns'.
+ (IU+20048): Likewise; add `<-same' and `<-formed@Zetian' for
+ U+541B.
+
+ * Ideograph-R017-Open-Box.el (U-0002067C): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014];
+ moved to Ideograph-R030-Mouth.el.
+
+ * Ideograph-R008-Lid.el (U-00020179): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014];
+ moved to Ideograph-R052-Short-Thread.el.
+
+ * Ideograph-R144-Walk-Enclosure.el (U-000275FA): Apply new
+ conventions for glyph granularity.
+
+ * Ideograph-R052-Short-Thread.el (U-00020179): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014].
+
+ * Ideograph-R023-Hiding-Enclosure.el (IU+20971): Use
+ `<-formed@Zetian' instead of `<-Zetian'.
+
+2014-12-27 MORIOKA Tomohiko <tomo.git@chise.org>
+
+ * Ideograph-R120-Silk.el (U-000200B3): Use
+ `ideographic-{radical|strokes}@daikanwa' instead of
+ `ideographic-{radical|strokes}@cns'.
+
+ * Ideograph-R077-Stop.el (U-0002398F): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014];
+ moved to Ideograph-R056-Shoot.el.
+
+ * Ideograph-R062-Halberd.el (U-000203B6): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014];
+ apply new conventions for glyph granularity.
+
+2014-12-27 MORIOKA Tomohiko <tomo.git@chise.org>
+
+ * Ideograph-R142-Insect.el (U-00020474): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014].
+
+ * Ideograph-R056-Shoot.el (U-0002398F): Omit
+ `ideographic-{radical|strokes}@ucs' [based on ISO/IEC 10646:2014].
+
+ * Ideograph-R014-Cover.el (U-0002F8D4): Use
+ `ideographic-{radical|strokes}@daikanwa' instead of
+ `ideographic-{radical|strokes}@ucs'.
+
+ * Ideograph-R096-Jade.el (U+7409): Apply new conventions for glyph
+ granularity.
+ (U+740A): Likewise.
+ (U+742E): Likewise.
+ (U+744B): Likewise.
+ (U+7462): Likewise.
+ (U+746F): Likewise.
+ (U+748B): Likewise.
+ (UU+74A1): Likewise.
+ (UU+74B0): Unify K0-7C3B.
+ (JU+74B0): Apply new conventions for glyph granularity.
+ (U+74C1): Likewise.
+ (U+74CA): Likewise.
+ (CU+74CE): Likewise.
+ (U+74CF): Likewise.
+ (CU+74D7): Likewise.
+ (U+74D8): Likewise.
+
+ * Ideograph-R210-Even.el (U+9F4A): Apply new conventions for glyph
+ granularity.
+ (U+9F50): Likewise.
+ (U+9F4B): Likewise.
+ (U-0002019C): Likewise.
+ (U-0002A5D1): Likewise.
+ (U-0002A5D2): Likewise.
+
+ * ideograph-util.el (char-daikanwa-radical): New function.
+ (char-daikanwa): Use `char-daikanwa-radical' instead of
+ `char-ideographic-radical'.
+
+2014-12-26 MORIOKA Tomohiko <tomo.git@chise.org>
+
+ * Ideograph-R074-Moon.el (g2-C4-296A): Use `==ucs@iso' instead of
+ `==ucs@unicode' for g2-IU+23367.
+ (UU+6717): Apply new conventions for glyph granularity.
+ (U+671A): Likewise.
+ (U+671E): Likewise.
+ (U-00023385): Likewise.
+ (U+6726): Likewise.
+ (U+6727): Likewise.
+
+ * Ideograph-R083-Clan.el (JU+6C10): Apply new conventions for
+ glyph granularity.
+ (U+6C13): Likewise.
+
2014-12-26 MORIOKA Tomohiko <tomo.git@chise.org>
+ * Ideograph-R067-Script.el (U+9F50): Apply new conventions for
+ glyph granularity; use `ideographic-{radical|strokes}@daikanwa'
+ instead of `ideographic-{radical|strokes}@cns';
+
+ * Ideograph-R060-Step.el (JU+5F7D): Apply new conventions for
+ glyph granularity.
+ (U+5F8C): Likewise.
+ (U+5F96): Likewise.
+ (U+5F9D): Likewise.
+ (U+5FAD): Likewise.
+ (U+5FAE): Likewise.
+ (U+5FAF): Likewise.
+ (U+5FB5): Likewise.
+ (UU+5FB9): Likewise.
+ (U+5FC2): Likewise.
+
* Ideograph-R029-Again.el (g2-IU+FA0E): Apply new conventions for
glyph granularity for a component of ideographic-structure.
(g2-UU+FA0E): Apply new conventions for glyph granularity for