(U+54CE): Apply new conventions for glyph granularity for components
authorMORIOKA Tomohiko <tomo.git@chise.org>
Sat, 5 Sep 2015 10:19:37 +0000 (19:19 +0900)
committerMORIOKA Tomohiko <tomo.git@chise.org>
Sat, 5 Sep 2015 10:19:37 +0000 (19:19 +0900)
commit449840ed368dea724a374e8a02a2d325381a52f1
treeb1ddf3feec498eb0cda45a4950f076432883bbb1
parent0c76a5def2b36890227d9de73e4424e5b4890189
(U+54CE): Apply new conventions for glyph granularity for components
of ideographic-structure.
(U+3615): Add representative nodes.
(U+56C8): Apply new conventions for glyph granularity for components
of ideographic-structure.
(CUU+56D2): Add representative nodes.
lisp/utf-2000/Ideograph-R030-Mouth.el