(U+53EB): Apply new conventions for glyph granularity for components
authorMORIOKA Tomohiko <tomo.git@chise.org>
Tue, 20 Dec 2016 04:40:50 +0000 (13:40 +0900)
committerMORIOKA Tomohiko <tomo.git@chise.org>
Tue, 20 Dec 2016 04:40:50 +0000 (13:40 +0900)
commit698131eca64c601274e5dfe2a87def7d6220fdbe
tree5249551292d79f93c8ed74d684944aa06c234971
parentab092c89eaad8d4cf7fb29edf781a4c92aa08404
(U+53EB): Apply new conventions for glyph granularity for components
of ideographic-structure.
(U-0002F839): Apply new conventions for glyph granularity.
(IU+20F36): Add representative node.
(CB03323): Likewise.
lisp/utf-2000/Ideograph-R030-Mouth.el